发明名称 Amorphous silicon-based thin film photovoltaic device
摘要 An amorphous silicon-based thin film photovoltaic device having a glass substrate (10) and a laminate structure formed on the glass substrate and consisting of a transparent electrode (20), a semiconductor layer (30) containing an amorphous silicon-based semiconductor and a back electrode (40), in which the glass substrate (10) has a transmittance of 88 to 90% for light having a wavelength of 700 nm and 84 to 87% for light having a wavelength of 800 nm. <IMAGE>
申请公布号 EP1069623(A1) 申请公布日期 2001.01.17
申请号 EP20000104571 申请日期 2000.03.14
申请人 KANEKA CORPORATION 发明人 NISHIO, HITOSHI
分类号 H01L31/04;H01L31/0216;H01L31/0376 主分类号 H01L31/04
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