发明名称 Salicide device with borderless contact
摘要 A method and structure for a field effect transistor structure for dynamic random access memory integrated circuit devices has a gate conductor, salicide regions positioned along sides of the gate conductor, a gate cap positioned above the gate conductor and at least one self-aligned contact adjacent the gate conductor.
申请公布号 US6174762(B1) 申请公布日期 2001.01.16
申请号 US19990260311 申请日期 1999.03.02
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BRONNER GARY B.;GAMBINO JEFFREY P.;HSU LOUIS L.;MANDELMAN JACK A.;RADENS CARL J.;TONTI WILLIAM R.
分类号 H01L21/336;H01L21/8242;(IPC1-7):H01L21/823;H01L21/320;H01L21/476;H01L29/769 主分类号 H01L21/336
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