| 摘要 |
PROBLEM TO BE SOLVED: To prevent radial unevenness of coating from being produced on a resist film by performing a control such that a flow of a three-way valve mounted to a pipe between a bubble sensor and an ejection nozzle is switched to a drain side when the bubble sensor mounted in a pipe between a pump and the ejection nozzle detects a bubble. SOLUTION: A wafer 19 is vacuum-chucked by a spin chuck 23 and these are rotated by a motor 25 through a rotation shaft 24, and a resist 2 in a resist bottle is pressure-transferred by pressurizing interiors of pipes 3, 7 by a pump 4 so as to be fed to a bubble detection sensor 13 through a filter 9 and a pipe 11. If a bubble is detected, the flow of a three-way valve 15 is switched to a drain side by a control section 26 on the basis of a detection signal so as to discharge the bubble to the drain side. On the other hand, if no bubble is detected, the resist is allowed to flow into pipes 14, 17 and ejected onto the wafer 19 performing rotation through an ejection nozzle 17 so as to spin-coat a surface of the wafer 19 with the resist. |
