发明名称 PURIFICATION OF SHIKIMIC ACID
摘要 PROBLEM TO BE SOLVED: To provide a method for purifying shikimic acid, capable of effectively isolating the shikimic acid in a high yield through a process suitable for industrial production, by contacting an aqueous solution containing shikimic acid and having a specific pH with an organic solvent. SOLUTION: This method for purifying shikimic acid comprises contacting (A) an aqueous solution containing shikimic acid and having a pH of 3.5 to 6 with (B) an organic solvent (for example, tetrahydrofuran) in an amount of 0.1-3 times, preferably 0.5-2 times, the weight of the component A to purify the shikimic acid. A culture solution comprising a liquid cultured by the use of microorganisms capable of producing the shikimic acid or a solid culture medium-extracting solution comprising extracts from a solid culture medium into hot water is exemplified as the aqueous solution containing shikimic acid. An inorganic acid or an organic acid is preferably used for controlling the aqueous solution containing shikimic acid so as to be pH 3.5 to 6. A 4-9C alcobol, ether or ester is preferably used as the component B. Protocatechuic acid and gallic acid are exemplified as impurities to be removed.
申请公布号 JP2001011013(A) 申请公布日期 2001.01.16
申请号 JP19990187550 申请日期 1999.07.01
申请人 TORAY IND INC 发明人 SAKAMOTO KOSUKE;SHIBAYAMA KATSUHIRO
分类号 C12P7/42;B01D11/04;C07C51/50;C07C62/34;(IPC1-7):C07C51/50 主分类号 C12P7/42
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