| 摘要 |
PROBLEM TO BE SOLVED: To obtain a sputtering target for forming a protective film for an optical disk, capable of remarkably reducing the generation of particles and reducing the frequency of the discontinuance or cessation of sputtering to improve productive efficiency and capable of giving a dielectric protective layer. SOLUTION: The protective film material for a sputtering target for forming a protective film for an optical disk is constituted of a three component system material of ZnS-SiO2-ZnO, and particularly constituted of a three component system material of ZnS-SiO2-ZnO in which the molar ratio ZnS:SiO2:ZnO is regulated so that it is within the range enclosed with lines connecting points A (80:10:10), B (47.5:5:47.5), C (25:25:50), D (5:47.5:47.5), E (25:50:25), and F(47.5:47.5:5) shown in the diagram.
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