发明名称 METHOD AND APPARATUS FOR MANUFACTURING INTAGLIO
摘要 PROBLEM TO BE SOLVED: To form a recess even on a scarcely ablated material by forming the recess by etching electric-discharge machining or drilling. SOLUTION: A recess is electric-discharge machined on a material 200 based on recess pattern data stored in a data memory 17. More particularly, an X- table 3, a Y-table 4 and an electric-discharge machining head 100 are moved based on the pattern data, a second machining electrode 1 is opposed to a position to be machined of the material 200 through a predetermined gap, a discharge is generated in this gap by a variable power source 12 to form the recess at a position to be machined. Accordingly, since the material 200 is electric-discharge machined to form the recess thereon, even by using a scarcely ablated metal material, the recess can be formed on the material. The scarcely ablated material of plastic materials is conductively treated or it is preferred to form the recess by a drill.
申请公布号 JP2001010012(A) 申请公布日期 2001.01.16
申请号 JP19990181141 申请日期 1999.06.28
申请人 RICOH MICROELECTRONICS CO LTD 发明人 KINOSHITA SHINGEN
分类号 B23H9/00;B41C1/02;B41C1/045;H05K3/20;H05K3/34;(IPC1-7):B41C1/02 主分类号 B23H9/00
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