发明名称 Electrostatic chuck and method for fabricating the same
摘要 The present invention provides an electrostatic chuck having a dielectric layer with improved porosity and electrical properties, and a method for fabricating the dielectric layer and applying the layer to a pedestal to form a portion of an electrostatic chuck. The dielectric layer is formed by a detonation gun process which includes igniting a fuel gas mixture to form a detonation wave and propelling aluminum oxide powder onto the pedestal at high speeds. The dielectric layer has a porosity of less than 1 percent of its total volume, which improves the electrical properties of the chuck, such as its dielectric strength and the dielectric constant. In addition, the low porosity decreases the adsorption of moisture and other gases into the dielectric layer, which further enhances the electrical properties of the chuck.
申请公布号 US6175485(B1) 申请公布日期 2001.01.16
申请号 US19960684113 申请日期 1996.07.19
申请人 APPLIED MATERIALS, INC. 发明人 KRISHNARAJ PADMANABHAN;LUE BRIAN;LINGAMPALLI RAMKISHAN RAO;WU SHUN JACKSON
分类号 H02N13/00;(IPC1-7):H02N13/00 主分类号 H02N13/00
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