| 摘要 |
PROBLEM TO BE SOLVED: To form an amorphous carbon film high in hardness and smoothness. SOLUTION: A film-forming chamber 1 provided on a film-forming device has two kinds of chambers 3, 5. One chamber 3 is a high-pressure sputtering chamber in which the atmosphere pressure is relatively high, and carbon particles are generated by sputtering carbon which is a carbon film forming material, and the other chamber 5 is a low pressure film forming chamber in which the pressure is relatively low, and the carbon particles generated in the high-pressure sputtering chamber 3 are formed into a film on the surface of a workpiece 4. The atmospheric pressure inside the high-pressure sputtering chamber 3 is set to a value capable of generating very film carbon particles by reducing the arc discharge 9 generated between carbon electrodes 7a, 7b, and plasma 13 is generated by the arc discharge 9. The atmospheric pressure inside the low pressure film forming chamber 5 is set to a value capable of increasing the range of the plasma 13 converted into plasma jet 35 by an orifice 33, and preventing the collision and coupling of the carbon particles in the plasma jet 35 with other gas molecules as much as possible to maintain the activity of the carbon particles. An amorphous carbon film is formed by blowing the plasma jet 35 against the workpiece 4 in the low pressure film forming chamber 5.
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