发明名称 |
SPUTTERING TARGET FOR FORMING PROTECTIVE FILM FOR OPTICAL DISK, AND ITS MANUFACTURE |
摘要 |
PROBLEM TO BE SOLVED: To obtain a target capable of reducing the generation of particles at the time of film formation by sputtering and suitable for the preparation of a protective film for a dielectric for an optical disk. SOLUTION: Color control is performed so that the (a) value and the (b) value of a color-difference meter representing the color of a ZnS-SiO2 sputtering target become -2 to 0 and 0 to 6, respectively, and the control of a stoichiometric deviation from the composition of the sputtering target by the resultant color index is carried out. By this method, the generation of particles having a correlation with the color of a target can be remarkably reduced and also the uniformity of a film can be improved. |
申请公布号 |
JP2001011614(A) |
申请公布日期 |
2001.01.16 |
申请号 |
JP19990187896 |
申请日期 |
1999.07.01 |
申请人 |
NIKKO MATERIALS CO LTD |
发明人 |
KUWANO KATSUO;TAKAMI HIDEO |
分类号 |
C04B35/16;C04B35/64;C23C14/34 |
主分类号 |
C04B35/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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