发明名称 SPUTTERING TARGET FOR FORMING PROTECTIVE FILM FOR OPTICAL DISK, AND ITS MANUFACTURE
摘要 PROBLEM TO BE SOLVED: To obtain a target capable of reducing the generation of particles at the time of film formation by sputtering and suitable for the preparation of a protective film for a dielectric for an optical disk. SOLUTION: Color control is performed so that the (a) value and the (b) value of a color-difference meter representing the color of a ZnS-SiO2 sputtering target become -2 to 0 and 0 to 6, respectively, and the control of a stoichiometric deviation from the composition of the sputtering target by the resultant color index is carried out. By this method, the generation of particles having a correlation with the color of a target can be remarkably reduced and also the uniformity of a film can be improved.
申请公布号 JP2001011614(A) 申请公布日期 2001.01.16
申请号 JP19990187896 申请日期 1999.07.01
申请人 NIKKO MATERIALS CO LTD 发明人 KUWANO KATSUO;TAKAMI HIDEO
分类号 C04B35/16;C04B35/64;C23C14/34 主分类号 C04B35/16
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