发明名称 PHOTODEGRADATION PASTE AND METHOD OF FORMING PATTERN BY THE USE OF THE SAME
摘要 PURPOSE: A photodegradation paste and a method of forming a pattern by the use of the same are provided to prevent a glass substrate from being deformed due to a high-temperature burning processing and to reduce a manufacturing cost. CONSTITUTION: A method of forming a pattern of a plasma display panel by the use of a paste comprises the following steps. The first step is to coat the paste including a photodegradation polymer and a photosensitizer on an upper portion of a substrate. An amount of the photosensitizer is in the range of 1 weight percent to 10 weight percents of an amount of the photodegradation polymer. The second step is to dry the paste. The third step is to apply an energy to the paste with a Xe-Hg lamp, laser, X-ray, gamma ray or electron beam. The applied energy is in the range of 1600 millijoules to 10 joules per a square centimeter. The fourth step is to perform a burning processing. When the energy is applied to the paste, a high molecule is dissolved into molecules of a small molecular weight. The dissolved paste can be burned out in a relatively low temperature of 350 deg.C to 400 deg.C.
申请公布号 KR20010004365(A) 申请公布日期 2001.01.15
申请号 KR19990024996 申请日期 1999.06.28
申请人 HYNIX SEMICONDUCTOR INC. 发明人 CHOI, GYEONG HUI
分类号 H01J11/22;H01J11/36;H01J11/42;(IPC1-7):H01J17/49 主分类号 H01J11/22
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