| 摘要 |
PURPOSE: A semiconductor mask is provided to easily achieve an exact mask pattern by varying a focus distance according to each step using a crystal. CONSTITUTION: The semiconductor mask comprises a light transmitting region(2) for transmitting lights of an optical source(1) into a photoresist(P/R) coated on a semiconductor wafer, and a light shield region(3) for shielding lights from the optical source(1). The semiconductor mask further include a crystal(7) formed on a rear surface of the light transmitting region(2) corresponding to a low step region(6) of the semiconductor wafer. That is, the focusing distance in accordance with the low step region(6) and a high step region(5) is compensated by controlling the thickness of the crystal(7).
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