METHOD FOR CLEANING STENCIL MASK

摘要

PURPOSE: A method for cleaning a stencil mask is provided to greatly improve precision of a pattern, by completely removing every material evaporated on the surface of an absorbing layer after an etching process. CONSTITUTION: Contaminated materials such as a deposition material(10) and an organic material(11) are generated in a wet-etching process for forming a frame of a stencil mask. The stencil mask is wet-etched using a wet-etching liquid which is a basic material melted in an alkaline solvent. The deposition material is peeled off from the surface of an absorbing layer(2) using the basic material. The organic material is eliminated by the alkaline solvent.