发明名称 METHOD FOR FORMING RECESS OF REFLECTIVE LIQUID CRYSTAL DISPLAY DEVICE
摘要 PURPOSE: A method for forming a recess of a reflective liquid crystal display device is provided to simplify a process, and to improve the transmissivity of a main visual angle direction. CONSTITUTION: A photo-resist film(41) is applied on a lower substrate(40) formed with a thin film transistor and a pixel electrode. A spacer(42) is distributed on the photo-resist film at random. The distributed spacer is partially embedded in the photo-resist film before curing. The photo-resist film is cured. The surface of the photo-resist film is rubbed using a roller(45). Due to the frictional force between the roller and the spacer, the spacer is removed, thereby a hemisphere shaped recess(45) is formed on the photo-resist film. The size of the recess is irregular. A high reflectance film(46) such as an aluminum film is deposited on the photo-resist film. An orientation film(48) is formed on the photo-resist film. Since this method for forming the recess of a reflective liquid crystal display device adopts the distribution step and the rubbing step without requiring the lithography step or the holography step, a process is simplified. Also, since the recess has a hemisphere shape and the high reflectance film is formed in the recess, the transmissivity of a main visual angle direction is improved.
申请公布号 KR20010004594(A) 申请公布日期 2001.01.15
申请号 KR19990025288 申请日期 1999.06.29
申请人 HYNIX SEMICONDUCTOR INC. 发明人 CHOI, SANG EON;SEO, DONG HAE;SIM, HWAN SU
分类号 G02F1/1335;(IPC1-7):G02F1/133 主分类号 G02F1/1335
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