| 摘要 |
PURPOSE: An apparatus for exhausting a residual reagent such as a liquid photoresist or a developing solution is provided to enable an exact detection of an exhausting state of the reagent. CONSTITUTION: An apparatus is used to exhaust a residual reagent(L) escaping from a rotating wafer(W) by centrifugal force. The wafer(W) is placed on a chuck(CK) rotated by an axis(R) in a spinner(SPN). The spinner(SPN) has also a nozzle(NZ) supplying the reagent to the wafer(W). The exhaust apparatus includes an exhaust pipe(EP) communicating with a tank(T) and extended downward around the spinner(SPN). The apparatus further includes a sensing part(SP) having a sensor supporter(SS) on the outside of the tank(T) and a sensor(S) in the sensor supporter(SS). The sensing part(SP) is connected to an exhaust measurer(EM) via a filter(F), and further, indirectly communicates with the tank(T) via a hole(H). Preferably, the diameter of the hole(H) is smaller than the width of the sensing supporter(SS). So, the sensor(S) is not exposed directly into the tank(T), and thereby the sensor(S) is prevented from being stained with the residual reagent(L).
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