ELECTROSTATIC CHUCK WITH IMPROVED TEMPERATURE CONTROLLING PERFORMANCE

摘要

PURPOSE: An electrostatic chuck with an improved temperature controlling performance is to relatively lengthen a staying time of a temperature controlling gas at an edge of a wafer, thereby equally controlling the temperature of an entire wafer. CONSTITUTION: An electrostatic chuck(100) with an improved temperature controlling performance comprises a temperature controlling gas supplying pipe(120) disposed at the inside of the electrostatic chuck and having an entrance/discharging port(140) at the edge side of a surface of the electrostatic chuck on which a wafer(20) is mounted; and a temperature controlling gas discharging pipe disposed at the inside of the electrostatic chuck and having an intake port for sucking temperature controlling gas leaked from the entrance/discharging port. In the chuck, the roughness at the edge side of the surface of the electrostatic chuck is bigger than that at a center portion of the surface so that a discharging speed of the temperature controlling gas may be slowed down at the edge side of the surface. The roughness of the surface of the electrostatic chuck is formed by a plurality of protrusions formed on the surface.