GAS SUPPLYING EQUIPMENT WITH MULTI-DIRECTIONAL GAS DIFFUSER AND METHOD OF SUPPLYING GAS USING GAS SUPPLYING EQUIPMENT

摘要

PURPOSE: A gas supplying equipment with a multi-directional gas diffuser and a method of supplying the gas using the equipment are provided to facilely supply the gas and prevent generation of particles during a gas supplying process. CONSTITUTION: The device comprises a reaction chamber(40); a wafer chuck(44) provided in the reaction chamber; a gas supplying pipe(42) connected to a side of the reaction chamber; and a diffuser(48) for decompressing gas introduced from the gas supplying pipe and spraying the gas to an upper portion of the wafer chuck. In the equipment, the diffuser is disposed at an entrance portion through which the gas from the gas supplying pipe is introduced to the reaction chamber. A method of supplying the gas using the equipment comprises the steps of: decompressing the gas introduced through the gas supplying pipe to the reaction chamber; and, at the same time, spraying a part of the gas to an upper space of the wafer chuck to be reached on the wafer chuck. In the method, the gas introduced to the reaction chamber is Si2H4.