发明名称 |
STRUCTURE OF VERTICAL BMFET HAVING MULTI-GATE AND FABRICATING METHOD THEREOF |
摘要 |
PURPOSE: A structure of a vertical BMFET(Bipolar Mode Field Emission Transistor) having a multi-gate and a fabricating method thereof are provided to improve electric characteristics by improving a structure of a vertical BMFET. CONSTITUTION: A source region(4) and a gate region(3) are formed under a source electrode(S) and a gate electrode(G). A PN junction is formed between the gate region(3) and the source region(4). An epitaxial layer(2) is formed on a substrate(1). A drain electrode is formed under the substrate(1). The gate region(3) is located on the epitaxial layer(2). A MOS type gate(90) is contacted commonly with each side of the source region(4), the gate region(3), and the epitaxial layer(2) through the insulating layer(100). The source region(4) and the drain region(1) are formed by implanting the first conductive dopant ions. The gate region(3) is formed by implanting the second conductive dopant ions.
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申请公布号 |
KR100275207(B1) |
申请公布日期 |
2001.01.15 |
申请号 |
KR19980016659 |
申请日期 |
1998.05.09 |
申请人 |
HAN, MIN GOO |
发明人 |
CHOI, YEON IK;HAN, MIN GOO;KIM, DU YEONG |
分类号 |
(IPC1-7):H01L29/732 |
主分类号 |
(IPC1-7):H01L29/732 |
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