| 摘要 |
PURPOSE: A heating system of a semiconductor manufacturing apparatus is provided to increase the quality of a solution and yield, by selectively exhausting air bubbles generated in an inducing and heating processes of the solution. CONSTITUTION: A heating system of a semiconductor manufacturing apparatus comprises a storing unit, a heating unit(20,30), a gas exhaust unit and a chemical solution exhausting unit. The storing unit stores a chemical solution induced from an induction opening. The heating unit heats the chemical solution in the storing unit. The gas exhaust unit exhausts the gas accumulated in the storing unit. The induction opening of the exhaust unit is located in a lower portion of the storing unit.
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