发明名称 |
SHAPE AND ARRANGEMENT OF ELECTRODES OF HAZARDOUS GAS TREATING REACTOR USING LOW TEMPERATURE PLASMA |
摘要 |
PURPOSE: Provided are shape and arrangement of electrodes mounted in a hazardous gas treating reactor using low temperature plasma, by which capacitance of the reactor can be reduced and a retention time in the reactor is obtained. CONSTITUTION: The shape and the arrangement of the electrode are characterized in that a plate(12a) is located between two trapezoid electrodes to form a combined electrode(12), wherein the plate(12a) has electrodes holes(13) formed at regular intervals, and the combined electrodes(12) and fin(10a) attached discharge electrodes(10) are arranged repeatedly by turns.
|
申请公布号 |
KR20010004835(A) |
申请公布日期 |
2001.01.15 |
申请号 |
KR19990025576 |
申请日期 |
1999.06.30 |
申请人 |
KOREA HEAVY INDUSTRIES & CONSTRUCTION CO., LTD. |
发明人 |
BAEK, MIN SU;CHOI, SEOK HO;HONG, SEONG BEOM;JANG, GIL HONG;MUN, SANG CHEOL;YOO, JEONG SEOK |
分类号 |
B01D53/00;(IPC1-7):B01D53/00 |
主分类号 |
B01D53/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|