发明名称 SHAPE AND ARRANGEMENT OF ELECTRODES OF HAZARDOUS GAS TREATING REACTOR USING LOW TEMPERATURE PLASMA
摘要 PURPOSE: Provided are shape and arrangement of electrodes mounted in a hazardous gas treating reactor using low temperature plasma, by which capacitance of the reactor can be reduced and a retention time in the reactor is obtained. CONSTITUTION: The shape and the arrangement of the electrode are characterized in that a plate(12a) is located between two trapezoid electrodes to form a combined electrode(12), wherein the plate(12a) has electrodes holes(13) formed at regular intervals, and the combined electrodes(12) and fin(10a) attached discharge electrodes(10) are arranged repeatedly by turns.
申请公布号 KR20010004835(A) 申请公布日期 2001.01.15
申请号 KR19990025576 申请日期 1999.06.30
申请人 KOREA HEAVY INDUSTRIES & CONSTRUCTION CO., LTD. 发明人 BAEK, MIN SU;CHOI, SEOK HO;HONG, SEONG BEOM;JANG, GIL HONG;MUN, SANG CHEOL;YOO, JEONG SEOK
分类号 B01D53/00;(IPC1-7):B01D53/00 主分类号 B01D53/00
代理机构 代理人
主权项
地址