TARGET OF APPARATUS FOR MANUFACTURING SEMICONDUCTOR FOR PERFORMING THIN FILM PROCESS

摘要

PURPOSE: A target of an apparatus for manufacturing a semiconductor for performing a thin film process is provided to prevent particles from being generated in a process, by preventing an arc from being generated in a vent hole to hinder a surface oxide layer from being melted. CONSTITUTION: A target(200) has a plane flange(208) coupled to an upper portion of a chamber in an apparatus for manufacturing a semiconductor for performing a thin film process. The target comprises an O-ring groove(210) and a vent hole(206). The O-ring groove is formed along the circumference of the flange, of which an outside inner wall is perpendicular to the flange. The vent hole has a constant shape, established in the flange so that the vent hole is positioned in a direction from an inside inner wall of the O-ring groove to the center of the target.