发明名称 MANUFACTURING SEMICONDUCTOR LIGHT EMITTING ELEMENT
摘要 PROBLEM TO BE SOLVED: To suppress stresses from growing due to film thickness difference on a transparent substrate for avoiding cracks in light emitting element parts. SOLUTION: Surface of a GaAs substrate is epitaxially grown to form an n-type clad layer 14, an active layer 15 and a p-type clad layer 16. After adhering a p-type transparent substrate 19 to the p-type clad layer 16 surface at the room temp., the GaAs substrate is removed. At the room temp. an n-type transparent substrate 20 is adhered to the clad layer 14 surface via an n-type In0.5Ga0.5P 13. The reafter, transparent substrates 19, 20 and the clad layers 16, 14 are adhered at a high temp.
申请公布号 JP2001007389(A) 申请公布日期 2001.01.12
申请号 JP19990174138 申请日期 1999.06.21
申请人 TOSHIBA CORP 发明人 YOSHITAKE HARUJI;FURUKAWA KAZUYOSHI
分类号 H01L33/30;H01L33/42;H01L33/56 主分类号 H01L33/30
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