| 摘要 |
PROBLEM TO BE SOLVED: To obtain high reliability (durability), to improve etching property and productivity, and to decrease the cost by forming a multilayered film consisting of, from the substrate side, a base coating layer of titanium nitride, a light-reflecting layer of a metal thin film and an upper layer of oxide to constitute a light-reflecting electrode. SOLUTION: The light-reflecting electrode formed on a substrate 10 to obtain a reflective electrode substrate consists of a multilayered film 5 produced by successively laminating, from the substrate side, a base coating layer 11 of titanium nitride, a light-reflecting layer 12 of a metal thin film and an upper layer 13 of oxide. Namely, the electrode substrate 1 is produced by forming the multilayered film 5 on a soda glass substrate 10, the surface of which is coated with silicon oxide (SiO2). The multilayered film 5 is produced by successively laminating the base coating layer (titanium nitride layer) 11, silver-based thin film 12, and upper layer (oxide thin film layer) 13 by sputtering. The titanium nitride has good adhesion property with the light-reflecting layer and prevents diffusion of alkali metals from the substrate to the light-reflecting layer 12. |
