| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a liquid crystal display device in which adhesion property between a thin film and a base layer, especially between a metal layer on a semiconductor layer and the base layer without increasing a production process by bringing at least a part of a drain line into contact with on the pattern of a multilayered film of the high melting point metal layer and the semiconductor layer processed at a time. SOLUTION: After a high melting point metal layer HTM such as titanium or tantalum is processed at a time with an a-Si semiconductor layer AS, a drain line DL consisting of pure molybdenum or molybdenum alloy layer is formed and patterned. Since a part of the drain line DL is in contact with the titanium or tantalum high melting point metal layer HTM, the adhesion property of the molybdenum or molybdenum alloy with a base along a cutting line CTLN is significantly improved, which almost prevents peeling or cutting of the drain line DL. Moreover, since the number of photomasks for patterning or the number of etching process is not increased, large load is not added to the production process and significant decrease in the productivity is prevented.</p> |
