发明名称 MANUFACTURE FOR MAGNETIC DISK SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To reduce generation of head crashes of a magnetic head and obtain a superior liftable characteristic by carrying out a texture working by a water dispersion of silicon dioxide with using silicon dioxide as an abrasive grain. SOLUTION: An aluminum based, copper based, titanium based or the like metal, glass, carbon, a synthetic resin, or the like is used for the magnetic disk substrate. The magnetic disk substrate is preferably formed of an aluminum based metal. The aluminum based metallic substrate is manufactured by passing a blank material cut from a strip of a sheet into a disk substrate shape through cutting, polishing, plating, mirror plane polishing and texture working processes, and through a nonmagnetic undercoat layer form process if necessary. In the texture working process, silicon dioxide is used as an abrasive grain in a water dispersion of silicon dioxide. Colloidal silica is preferred as the water dispersion of silicon dioxide. An average particle size of silicon dioxide is preferably set to 0.01-0.10μm and a concentration of the water dispersion is preferably set to 5-50 wt.%.</p>
申请公布号 JP2001006162(A) 申请公布日期 2001.01.12
申请号 JP19990177996 申请日期 1999.06.24
申请人 MITSUBISHI CHEMICALS CORP 发明人 YOKOYAMA MASATAKA;SHIGERU TOMOO
分类号 B24B21/00;B24B37/00;C09K3/14;G11B5/84;(IPC1-7):G11B5/84 主分类号 B24B21/00
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