发明名称 MANUFACTURE OF PHOSPHOR PATTERN, PHOTOSENSITIVE ELEMENT FOR USE IN IT, PHOSPHOR PATTERN AND BACK PLATE FOR PLASMA DISPLAY PANEL
摘要 PROBLEM TO BE SOLVED: To provide a phosphor pattern excellent in embeddability in the space of a base having rugged parts, separability and removability when peeling an embedded layer and tolerance of exposure conditions while having a highly precise and uniform shape, a manufacturing method for it, a light sensitive element having excellent suppression of edge fusion and good workability, and a back plate for a plasma display panel equipped with a phosphor pattern excellent in luminance. SOLUTION: With a photosensitive resin composition layer 8 containing a phosphor, a protective layer 7 and an embedded layer 6 disposed one by one on a base 1 having rugged pats, the three layers are laminated on the base having the rugged parts by applying pressure to the embedded layer, an active ray 11 is imagingly irradiated onto the photosensitive resin composition layer the protective layer and the embedded layer are removed, the photosensitive resin composition layer is selectively removed by development in order to form a pattern, and a phosphor pattern is formed by removing organic components by baking.
申请公布号 JP2001006546(A) 申请公布日期 2001.01.12
申请号 JP19990307944 申请日期 1999.10.29
申请人 HITACHI CHEM CO LTD 发明人 KAWAKAMI HIROYUKI;SUGIURA YUMIKO;NOJIRI TAKESHI;SATO KAZUYA;SHIMAMURA MARIKO;TAI SEIJI
分类号 H01J9/227;C08F2/50;G03F7/004;G03F7/11;G03F7/30;G03F7/40;H01J11/22;H01J11/34;H01J11/42 主分类号 H01J9/227
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