| 摘要 |
PROBLEM TO BE SOLVED: To effectively remove contaminants from a substrate, where an insulating film of a plurality of silicon dioxide with different impurity content is exposed, while no roughness is generated between both insulating films by having it contain alkaline amine organic compound and hydrogen peroxide. SOLUTION: Alkaline amine organic compound and hydrogen peroxide are included. Tetraaliylammonium hydroxide or trialkyl (hydroalkyl) ammonium/ hydroxide, etc., are used as alkaline amine organic compound. The content of alkaline amine organic compound is preferably set at about 0.0001-5.0 wt.%. The content of hydrogen peroxide is preferably set at about 0.01-20 wt.%. Thus, contaminants are effectively removed from a substrate, where an insulating film of a plurality of silicon dioxide with different impurity content is exposed, without roughness being generated between both insulating films.
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