| 摘要 |
PROBLEM TO BE SOLVED: To obtain a silicon-containing polymer which is easily produced and has excellent storage stability, which is suitable as a resist material easily developed with a general alkali developer, and which satisfies all of high sensitivity, high resolution, high O2-RIE resistance and high heat resistance by incorporating a specified structure into the main structural unit. SOLUTION: The polymer contains a structure expressed by formula I as the main structural unit. In formula, R1 is a monovalent organic group, R2 is a direct bond or bivalent organic group, R3 is a monovalent organic group or organosilyl group, and these groups may be present in a plurality of kinds, X is hydrogen atom, a monovalent organic group or organosilyl group, and it may be present in a plurality of kinds, each of k and l is a positive integer, each of m and n is 0 or a positive integer satisfying the relation of formula II. Namely, each of the carboxylic acid-containing triorganosiloxane portion and the carboxylic acid derivative group-containing triorganosiloxane portion is specified to a specified ratio expressed by l and m. |
