| 摘要 |
PROBLEM TO BE SOLVED: To inspect the defect of film formation with high reflectivity regardless of the quality of a formed film. SOLUTION: This device is provided with a control part 7 for setting the wavelength of an outgoing light, a spectroscope unit 4 for outgoing a light with wavelength set by the control part 7 to a light recording medium 1 on which at least a film to be inspected is formed, a light receiving part 5 for receiving a reflected light obtained when the light outgoing form the spectroscope unit 4 is reflected, and a detector 6 for detecting the change of the reflectivity of the reflected light. The control part 7 sets a light in a wavelength region for increasing the change of the reflectivity according to the film to be inspected.
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