发明名称 APPARATUS FOR MEASURING PRESSURE OF PUMP IN SEMICONDUCTOR WAFER DEPOSITOR
摘要 PURPOSE: An apparatus for measuring a pressure of a pump in a semiconductor wafer depositor is provided to detect the difference between pressures within a pump exhaust tube by installing a pressure gauge between a check valve of a pump exhaust tube and a scrubber. CONSTITUTION: An inflow tube(13) and an opening/shutting solenoid value(11) are used for providing a nitrogen gas into a dry pump(10). A cylenser(30), an opening/shutting silencer(31), and an exhaust tube(32) are formed at a pump exhaust hole(12) of the dry pump(10). A scrubber(40) is installed in one end portion of the exhaust tube(32). A check value(31) is connected with the scrubber(40) by the exhaust tube(32). An exhaust pressure detection portion(50) is used for detecting a variation of pressure of the exhaust tube(32). A pressure control portion(C) is installed among the inflow tube(13), the pump exhaust hole(12), and a controller(20) in order to control a pressure of the nitrogen gas. The controller(20) is used for controlling the solenoid valve, the pressure control portion(C), and the exhaust pressure detection portion(50).
申请公布号 KR100286339(B1) 申请公布日期 2001.01.11
申请号 KR19980017340 申请日期 1998.05.14
申请人 HYUNDAI MICRO ELECTRONICS CO., LTD. 发明人 KIM, SEONG HAK
分类号 H01L21/20;(IPC1-7):H01L21/20 主分类号 H01L21/20
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