| 摘要 |
<p>In a method for patterning a layer of a low dielectric constant material a surface imaging material (104) is applied on a layer of a low dielectric constant material (102). A pattern is then defined in the surface imaging material (104). Next, the patterned surface imaging material (104) is hardened by silylation so that the patterned surface imaging (104) material functions as a hard mask. Thereafter, the pattern defined in the surface imaging material (104) is transferred to the layer of the low dielectric constant material (102).</p> |
