发明名称 ELECTRODE TEMPERATURE CONTROL SYSTEM OF SEMICONDUCTOR EQUIPMENT
摘要 PURPOSE: An electrode temperature control system of a semiconductor equipment is provided to maintain uniformly a temperature of a wafer by implanting a gas of small molecular weight into an aperture formed between an electrode and a heat exchange. CONSTITUTION: A heat exchange body(20) is installed on a bottom portion of a main chamber(10). An electrode(30) is located on the heat exchange body(20). A heat exchanger(40) provides a heat exchange medium to the heat exchange body(20). A heat exchange medium circulation tube(50) is used for circulating the heat exchange medium. The first passing hole(61) is used for connecting the heat exchange body(20) with an aperture(25) formed between the electrode(30) and the heat exchange body(20). A gas supply portion(62) is installed at an outside of the main chamber(10). A gas supply tube(63) is connected with the first passing hole(61). A gas flow controller(64) controls the amount of gas. A gas pressure controller(65) controls a pressure of gas. The second passing hole(71) is used for connecting the heat exchange body(20) with the aperture(25). A gas exhaust tube(72) is inserted into the second passing hole(71). An exhaust pump(73) is used for absorbing the gas. A damper(74) is used for controlling the amount of exhaust gas.
申请公布号 KR100286338(B1) 申请公布日期 2001.01.11
申请号 KR19980016611 申请日期 1998.05.09
申请人 HYUNDAI MICRO ELECTRONICS CO., LTD. 发明人 LEE, WON BAEK
分类号 H01L21/26;(IPC1-7):H01L21/26 主分类号 H01L21/26
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