Method of making sputtering targets

摘要

There is provided a method for fabricating high density sputter targets (20) by pre-packing a powder bed (10) by hot pressing or vibration between metal plates (14, 16) followed by hot isostatic pressing. This method is especially suitable for preparing sputter targets (20) with a radius to thickness ratio of at least 3 and a density of at least 96% of theoretical.