摘要 |
<p>The present invention provides a process for producing halogenated benzene compounds. In the process, an organometallic compound represented by the general formula I: <CHEM> wherein M represents an R<1>3Sn group, an R<1>3Si group, an R<1>3Ge group, an (R<2>CO2)Hg group, a ClHg group or an (R<3>O)2B group wherein each R<1> independently represents a C1 - C8 alkyl group, R<2> represents a C1 - C3 alkyl group or a C1 - C3 haloalkyl group, R<3> represents a hydrogen atom or a C1 - C3 alkyl group, n represents an integer of from 0 to 4, m represents an integer of from 0 to 1, each A independently represents a fluorine atom, a nitro group, a cyano group, a C1 - C8 alkyl group, a C1 - C8 alkoxy group or a C2 - C8 acyloxy group, and Q represents an organic residue, is reacted in a solvent with a halide ion represented by the general formula X<->, under light irradiation conditions in the presence of a semiconductor catalyst with a photocatalytic activity.</p> |