Photolithographic processing for polymer LEDs with reactive metal cathodes

摘要

A method for patterning a layer that includes a material sensitive to water or active hydrogen. The method utilizes a photoresist that includes a photoacid generator and a polymer constructed from fragments that are heat labile when heated to a predetermined temperature, the polymer being stable at the predetermined temperature and soluble in a solvent that does not contain water or active hydrogen. The fragments are joined by acid labile links to form the polymer. The photoacid generator includes a compound that releases acid when exposed to light. In a patterning method according to the present invention, the layer to be patterned is covered with a layer of the photoresist. The regions of the photoresist layer that overlay regions of the patterned layer that are to be removed are exposed to light. The layer of photoresist is then subjected to heating at or above the predetermined temperature to expose the regions of the patterned layer that are to be removed. The portions of the patterned layer that are not covered by photoresist are then removed. Finally, any remaining photoresist is removed by washing in the solvent. The method is well suited to patterning reactive metal layers to form electrodes for multi-colored OLED displays.