发明名称 |
Plasma reactor with a deposition shield |
摘要 |
A reactor 20 includes a shield 50 which prevents the deposition of materials along a line-of-sight path from a wafer 26 toward and onto an electrode 32, or a window 38 which couples an electrode 32 to a reaction chamber of the reactor 20. The shield can be comprised of a conductor and/or an insulator. The shield can affect the character of a plasma generated in the reactor.
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申请公布号 |
US6170431(B1) |
申请公布日期 |
2001.01.09 |
申请号 |
US19990434990 |
申请日期 |
1999.11.05 |
申请人 |
TEGAL CORPORATION |
发明人 |
DEORNELLAS STEPHEN P.;DITIZIO ROBERT A. |
分类号 |
H01L21/302;C23C14/56;C23C16/00;C23F1/02;H01J37/32;H01L21/00;H01L21/3065;H05H1/00;(IPC1-7):C23C16/00 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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