| 发明名称 |
Method and apparatus for plasma processing apparatus |
| 摘要 |
A plasma processing apparatus and method of processing a specimen by a plasma. The method and apparatus includes independently controlling a density distribution of the plasma.
|
| 申请公布号 |
US6172321(B1) |
申请公布日期 |
2001.01.09 |
| 申请号 |
US19990433551 |
申请日期 |
1999.11.04 |
| 申请人 |
HITACHI, LTD. |
发明人 |
YOSHIOKA KEN;KANAI SABUROU;KAJI TETSUNORI;NISHIO RYOJI;EDAMURA MANABU |
| 分类号 |
H01J37/32;(IPC1-7):B23K10/00 |
主分类号 |
H01J37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
