发明名称 GAS SUPPLYING METHOD OF PLASMA PROCESSING MACHINE AND DEVICE THEREFOR
摘要 PROBLEM TO BE SOLVED: To enable an adjustment of a flow rate or a pressure of at least either a plasma main gas or a plasma assist gas supplied to a plasma torch depending on the thickness, material, and the cutting form of a work, and to improve cutting precision and cutting quality. SOLUTION: An optimum value of cutting condition such as the supply rate of plasma main gas and that of plasma assist gas which are set depending on each of material of various works, plate thickness and cutting work form, is stored as a cutting condition data base in a memory part 39, the optimum values of the plasma main bas supply and the plasma assist gas supply are read out of the memory part 39 for each material, plate thickness, and cutting work form which are recognized from CAD/CAM device 38, and each gas supply rate is adjusted by controlling electromagnetic valves 28 and 32 together with pneumatic-electro regulators 29 and 33.
申请公布号 JP2001001154(A) 申请公布日期 2001.01.09
申请号 JP19990172747 申请日期 1999.06.18
申请人 KOMATSU LTD 发明人 KAHATA TETSUYA
分类号 B23K10/00;(IPC1-7):B23K10/00 主分类号 B23K10/00
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