发明名称 Semiconductor interconnection structure and method
摘要 A memory device and method in which the capacitor lower electrode within the memory cell array and a first interconnection layer within the peripheral circuitry are provided simultaneously from the same conductive material. The capacitor upper electrode and a second interconnection layer within the peripheral circuitry are also provided simultaneously from the same conductive material.
申请公布号 US6172387(B1) 申请公布日期 2001.01.09
申请号 US19980071860 申请日期 1998.05.04
申请人 MICRON TECHNOLOGY, INC. 发明人 THAKUR RANDHIR P. S.;WU JEFF
分类号 H01L21/02;H01L21/768;H01L21/8239;H01L21/8242;H01L27/108;(IPC1-7):H01L29/78;H01L33/00 主分类号 H01L21/02
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