发明名称 Exposure apparatus and method
摘要 In order to improve the throughput of a scanning type of exposure system while maintaining the positioning precision, the positioning error range epsiS at the scan start position is set to be less strict than the positioning error range epsiE at the start of exposure. This reduces the settling time TS before acceleration from the scan start position toward the exposure start position can commence. Thus, upon finishing exposure of a current shot area, the substrate stage moves toward a target position, which is to be the scan start position. The velocity of the substrate stage reaches substantially zero at the scan start position. The substrate stage 17 slightly oscillates at the scan start position during positioning. When the differences between a target position and a detected position remain within an acceptable positioning error range epsiS (or tolerance) at the scan start position for a predetermined number of sampling values, acceleration toward the exposure area commences. The large positioning error that results from loosening of the positioning precision (or tolerance) is corrected between the scan start time and the exposure start time.
申请公布号 US6172739(B1) 申请公布日期 2001.01.09
申请号 US19980195902 申请日期 1998.11.19
申请人 NIKON CORPORATION 发明人 MURATA MINORU
分类号 G03B27/42;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/42 主分类号 G03B27/42
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