| 摘要 |
PURPOSE: An apparatus for thermal-treating gel to eliminate organics and OH ions for silica glass formation is provided, which is characterized by having quartz refractory plug to prevent the inflow of impurities. The resultant high purity silica glass is applicable to semiconductors or optical fibers. CONSTITUTION: The apparatus comprises; a quartz process tube(10) through a furnace body(11); several heaters(14) near the process tube for heating a sample in the process tube; a doughnut-typed refractory plug(13) containing alkaline metals or alkali earth metals such as Na or Ca, installed in the both ends of the process tube for insulating the tube; a quartz end cap(12) linked to the both ends of the tube for blocking gas leakage, having a hole for inlet or outlet of the process gas such as air, O2, Cl2 or He.
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