发明名称 |
AUTOMATIC GATE VALVE FOR A SEMICONDUCTOR PROCESSING EQUIPMENT |
摘要 |
PURPOSE: An automatic gate valve for a semiconductor processing equipment is provided to increase a space usage percentage as the number of chambers increase by establishing the gate valve inside a housing of an automatic transfer apparatus, and to simplify maintenance of the equipment by simplifying a complicated operating structure of the gate valve while satisfying the function of the valve itself by a compact structure of the overall equipment. CONSTITUTION: An automatic gate valve for a semiconductor processing equipment comprises a driving shaft, a shutter, a link and an arm. The driving shaft transforms a straight line motion to a rotational motion, established inside a housing of an automatic transfer apparatus. The shutter is driven as one body with the driving shaft. The link presses the shutter by a revolving power of the driving shaft. The arm maintains a rotational center of the shutter.
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申请公布号 |
KR20010000900(A) |
申请公布日期 |
2001.01.05 |
申请号 |
KR20000063234 |
申请日期 |
2000.10.26 |
申请人 |
HB SEMATECH CO., LTD.;PARCK, SANG KU |
发明人 |
LEE, SI YEONG;PARCK, SANG KU |
分类号 |
H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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