发明名称 AUTOMATIC GATE VALVE FOR A SEMICONDUCTOR PROCESSING EQUIPMENT
摘要 PURPOSE: An automatic gate valve for a semiconductor processing equipment is provided to increase a space usage percentage as the number of chambers increase by establishing the gate valve inside a housing of an automatic transfer apparatus, and to simplify maintenance of the equipment by simplifying a complicated operating structure of the gate valve while satisfying the function of the valve itself by a compact structure of the overall equipment. CONSTITUTION: An automatic gate valve for a semiconductor processing equipment comprises a driving shaft, a shutter, a link and an arm. The driving shaft transforms a straight line motion to a rotational motion, established inside a housing of an automatic transfer apparatus. The shutter is driven as one body with the driving shaft. The link presses the shutter by a revolving power of the driving shaft. The arm maintains a rotational center of the shutter.
申请公布号 KR20010000900(A) 申请公布日期 2001.01.05
申请号 KR20000063234 申请日期 2000.10.26
申请人 HB SEMATECH CO., LTD.;PARCK, SANG KU 发明人 LEE, SI YEONG;PARCK, SANG KU
分类号 H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/68
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