发明名称 PREPARATION METHOD OF GAN SINGLE CRYSTAL BY MELTING
摘要 PURPOSE: A method for preparing GaN single crystal by melting is provided, to reduce defects such as dislocation due to the lattice mismatch and the difference of thermal expansion coefficients. CONSTITUTION: The method comprises the steps of mixing gallium(Ga) with Na or NaN3 being a catalyst in a furnace placed in an isolated reactor; flowing nitrogen gas into the reactor to increase the pressure and to make the nitrogen atmosphere; and heating the furnace to melt Ga and the catalyst and to grow GaN single crystal. Preferably the mixture of Ga and a catalyst contains further GaN single crystal with the size of 0.3-1.0 mm as a seed; and the mixture is doped with Mg, Na, Sr or Ba. The furnace is formed by using graphite, polycrystalline boron nitride.
申请公布号 KR20010000827(A) 申请公布日期 2001.01.05
申请号 KR20000062134 申请日期 2000.10.21
申请人 CHO, CHAE RYONG;COMTECS CO., LTD.;JEONG, SE YOUNG 发明人 CHO, CHAE RYONG;JEONG, SE YOUNG
分类号 C30B29/38;(IPC1-7):C30B29/38 主分类号 C30B29/38
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