发明名称 |
PREPARATION METHOD OF GAN SINGLE CRYSTAL BY MELTING |
摘要 |
PURPOSE: A method for preparing GaN single crystal by melting is provided, to reduce defects such as dislocation due to the lattice mismatch and the difference of thermal expansion coefficients. CONSTITUTION: The method comprises the steps of mixing gallium(Ga) with Na or NaN3 being a catalyst in a furnace placed in an isolated reactor; flowing nitrogen gas into the reactor to increase the pressure and to make the nitrogen atmosphere; and heating the furnace to melt Ga and the catalyst and to grow GaN single crystal. Preferably the mixture of Ga and a catalyst contains further GaN single crystal with the size of 0.3-1.0 mm as a seed; and the mixture is doped with Mg, Na, Sr or Ba. The furnace is formed by using graphite, polycrystalline boron nitride.
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申请公布号 |
KR20010000827(A) |
申请公布日期 |
2001.01.05 |
申请号 |
KR20000062134 |
申请日期 |
2000.10.21 |
申请人 |
CHO, CHAE RYONG;COMTECS CO., LTD.;JEONG, SE YOUNG |
发明人 |
CHO, CHAE RYONG;JEONG, SE YOUNG |
分类号 |
C30B29/38;(IPC1-7):C30B29/38 |
主分类号 |
C30B29/38 |
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地址 |
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