METHOD FOR SYNTHESIZING BASE-CONTAINING OLIGOMER ON SOLID MATRIX USING POLYMERIC PHOTOACID GENERATOR

摘要

PURPOSE: A method for synthesizing a base-containing oligomer on a solid matrix using a polymeric photoacid generator is provided which has highly simplified steps and which can effectively synthesize the oligomer compared with a conventional method such as a photoresist (PR) method and a photoacid patterned array (PPA) method used in the production of DNA chip. CONSTITUTION: The method for synthesizing the base-containing oligomer on the solid matrix using the polymeric photoacid generator comprises the steps of : (1) attaching a linker that is masked with a protecting group unstable to an acid, to the solid matrix; (2) coating the solid matrix with the polymeric photoacid generator; (3) exposing the coated solid matrix to light and generating the acid to remove the protecting group unstable to the acid; (4) binding the solid matrix unmasking protecting group to the monomer of the base-containing oligomer masked with a protecting group unstable to the acid; and (5) removing the residual polymeric photoacid generator in reaction and carrying out from step (2) to step (5) repeatedly to synthesize the desired length of the base-containing oligomer.