发明名称 |
Production of a semiconductor wafer used as the base material for a semiconductor component comprises removing the semiconductor from a single crystal, processing by ductile chip removal, and polishing and cleaning the surface |
摘要 |
Production of a semiconductor wafer comprises removing the semiconductor from a single crystal, processing the semiconductor wafer surface by ductile chip removal, and polishing and cleaning the surface. Preferred Features: The processing of the semiconductor wafer surface is carried out by ductile chip removal as well as on the front and rear sides.
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申请公布号 |
DE19928949(A1) |
申请公布日期 |
2001.01.04 |
申请号 |
DE19991028949 |
申请日期 |
1999.06.24 |
申请人 |
WACKER SILTRONIC GESELLSCHAFT FUER HALBLEITERMATERIALIEN AG |
发明人 |
HUBER, ANTON |
分类号 |
H01L21/304;B24B1/00;B24B7/22;B24B37/04;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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