发明名称 Production of a semiconductor wafer used as the base material for a semiconductor component comprises removing the semiconductor from a single crystal, processing by ductile chip removal, and polishing and cleaning the surface
摘要 Production of a semiconductor wafer comprises removing the semiconductor from a single crystal, processing the semiconductor wafer surface by ductile chip removal, and polishing and cleaning the surface. Preferred Features: The processing of the semiconductor wafer surface is carried out by ductile chip removal as well as on the front and rear sides.
申请公布号 DE19928949(A1) 申请公布日期 2001.01.04
申请号 DE19991028949 申请日期 1999.06.24
申请人 WACKER SILTRONIC GESELLSCHAFT FUER HALBLEITERMATERIALIEN AG 发明人 HUBER, ANTON
分类号 H01L21/304;B24B1/00;B24B7/22;B24B37/04;(IPC1-7):H01L21/304 主分类号 H01L21/304
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