发明名称 HIGH DENSITY TUNGSTEN MATERIAL SINTERED AT LOW TEMPERATURE
摘要 The invention concerns a tungsten-based sintered material, with relative mean density higher than 93 % and HV0.3 hardness >/= 400. It comprises: tungsten having a purity higher than 99.9 %, an additive consisting of nickel and/or cobalt powder in a mass percentage not more than 0.08 %, an average particle size of tungsten grains of equiaxial shape ranging between 2 and 40 mu m and uniformly distributed for a given average size; and uniformly distributed residual porosity with less than 85 % of the population of pores having a unit volume less than 4 mu m<3>.
申请公布号 WO0100892(A1) 申请公布日期 2001.01.04
申请号 WO2000FR01656 申请日期 2000.06.15
申请人 CIME BOCUZE;NICOLAS, GUY;MAHOT, PASCAL;VOLTZ, MARC 发明人 NICOLAS, GUY;MAHOT, PASCAL;VOLTZ, MARC
分类号 B22F3/10;C22C1/04;C22C27/04;F27B14/10;F27D1/00 主分类号 B22F3/10
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