发明名称 HIGH RPM MEGASONIC CLEANING
摘要 <p>A method that involves spraying a liquid agitated with a sonic wave at a megasonic frequency onto a substrate (204) from a nozzle (201) positioned over the substrate. Simultaneously, the substrate is spun above 300RPM while the nozzle is swept over the substrate. The substrate may be brushed in a brush station before agitating the liquid with the sonic wave. An apparatus having an arm (202) in fluid communication with a nozzle that has an angular position υ greater than 0°. Also, there is a substrate spinner (212) positioned below the nozzle.</p>
申请公布号 WO2001000335(A1) 申请公布日期 2001.01.04
申请号 US2000016364 申请日期 2000.06.13
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