发明名称 |
PLASMA PROCESSOR WITH COIL RESPONSIVE TO VARIABLE AMPLITUDE RF ENVELOPE |
摘要 |
A vacuum plasma processor includes a coil for reactively exciting a plasma so plasma incident on a workpiece has substantially uniformity. The coil and a window which reactively couples fields from the coil to the plasma have approximately the same diameter. An r.f. source supplies a pulse amplitude modulated envelope including an r.f. carrier to the coil. |
申请公布号 |
WO0101443(A1) |
申请公布日期 |
2001.01.04 |
申请号 |
WO2000US17088 |
申请日期 |
2000.06.22 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
HOLLAND, JOHN |
分类号 |
H05H1/46;H01J37/32;H01L21/302;H01L21/3065 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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