发明名称 A PLASMA REACTION CHAMBER COMPONENT HAVING IMPROVED TEMPERATURE UNIFORMITY
摘要 <p>A component useful for a plasma reaction chamber includes a heat sink such as a temperature-controlled support member (22) and a heated member such as an electrically powered showerhead electrode (20). The showerhead electrode is peripherally secured to the support member to enclose a gas distribution chamber between a top surface (30) of the electrode and a bottom surface (32) of the support member. A heat transfer member (36) extends between the electrode and the support member and transfers heat from an area of highest temperature buildup on the top surface of the showerhead electrode to the bottom surface of the support member in order to control the temperature distribution across the showerhead electrode.</p>
申请公布号 WO0101442(A1) 申请公布日期 2001.01.04
申请号 WO2000US16786 申请日期 2000.06.14
申请人 LAM RESEARCH CORPORATION;HAO, FANGLI;DHINDSA, RAJINDER;POURHASHEMI, JAVAD 发明人 HAO, FANGLI;DHINDSA, RAJINDER;POURHASHEMI, JAVAD
分类号 H05H1/46;C23C16/44;C23C16/455;H01J37/32;H01L21/00;H01L21/302;H01L21/3065;(IPC1-7):H01J37/32;H01J37/34 主分类号 H05H1/46
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