POLISHING OF FLUORIDE CRYSTAL OPTICAL LENSES AND PREFORMS USING CERIUM OXIDE FOR MICROLITHOGRAPHY
摘要
The invention provides a means for making below 200 nm VUV optical microlithography lens elements and preforms therefor. The inventive methods include polishing a fluoride optical lithography crystal with cerium to a surface roughness less than five angstroms. The invention includes making a 157 nm VUV optical lithography element preform by polishing a calcium fluoride crystal with cerium oxide polish.
申请公布号
WO0100907(A1)
申请公布日期
2001.01.04
申请号
WO2000US15575
申请日期
2000.06.06
申请人
CORNING INCORPORATED;DARCANGELO, CHARLES, M.;SABIA, ROBERT;STEVENS, HARRIE, J.;WILLIAMSON, PAUL, J.
发明人
DARCANGELO, CHARLES, M.;SABIA, ROBERT;STEVENS, HARRIE, J.;WILLIAMSON, PAUL, J.