FLUID DELIVERY STABILIZATION FOR WAFER PREPARATION SYSTEMS

摘要

A solution delivery system for use with a wafer preparation system is provided. The solution delivery system includes a de-ionized water (DIW) dispense drawer (134) having an input for receiving an initial flow of DIW from a facility water supply (136). The DIW dispense drawer (134) further includes a first pressure regulator (150) for stabilizing the initial flow of DIW and producing a substantially steady flow of DIW as a DIW output of the DIW dispense drawer (134). A chemical drawer (132) is also provided as part of the solution delivery system. The chemical drawer (132) is configured to receive the substantially steady flow of DIW from the DIW dispense drawer (134). The chemical drawer (132) is further configured to receive an initial flow of chemicals from a chemical source. The chemical drawer (132) also includes a second pressure regulator for stabilizing the initial flow of chemicals from the chemical source and thus producing a substantially steady flow of chemicals. In this example, the chemical drawer (132) further includes a mix manifold for mixing the substantially steady flow of DIW received from the DIW dispense drawer (134) and the substantially steady flow of chemicals. The mix manifold is configured to output a chemical solution having a controlled concentration.